Specific Process Knowledge/Etch/Etching of Chromium: Difference between revisions

![[Specific Process Knowledge/Etch/Wet Aluminium Etch|Al wet etch 1]]

![[Specific Process Knowledge/Etch/Wet Aluminium Etch|Al wet etch 2]]

![[Specific_Process_Knowledge/Etch/ICP_Metal_Etcher|Al etch by ICP metal]]

![[Specific_Process_Knowledge/Etch/IBE⁄IBSD Ionfab 300|Al sputtering by IBE (Ionfab300+)]]

Ething of Chromium can be done either wet or dry. For wet etching please see below on this page. Dry etching can be done either with [[Specific Process Knowledge/Etch/ICP Metal Etcher|ICP]] using Chlorine chemistry or with [[Specific Process Knowledge/Etch/IBE/IBSD Ionfab 300|IBE]] by sputtering with Ar ions.