Jump to content

Specific Process Knowledge/Etch/Etching of Aluminium: Difference between revisions

BGE (talk | contribs)
BGE (talk | contribs)
Line 19: Line 19:
|-style="background:silver; color:black"
|-style="background:silver; color:black"
!
!
![[Specific Process Knowledge/Thin film deposition/Furnace LPCVD Nitride|Methode 1]]
![[Specific Process Knowledge/Thin film deposition/Furnace LPCVD Nitride|Al wet etch 1]]
![[Specific Process Knowledge/Thin film deposition/PECVD|Methode 2]]
![[Specific Process Knowledge/Thin film deposition/PECVD|Al wet etch 2]]
![[Specific Process Knowledge/Thin film deposition/PECVD|Al etch by ICP metal]]
![[Specific Process Knowledge/Thin film deposition/PECVD|Al sputtering by IBE (Ionfab300+)]]
|-
|-