Specific Process Knowledge/Etch/Etching of Aluminium: Difference between revisions
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*[[Specific Process Knowledge/Etch/Wet Aluminium Etch|Etching of Al by wet etch]] | *[[Specific Process Knowledge/Etch/Wet Aluminium Etch|Etching of Al by wet etch]] | ||
*[[Specific_Process_Knowledge/Etch/ICP_Metal_Etcher/Aluminium|Etching of Al by dry etch]] | *[[Specific_Process_Knowledge/Etch/ICP_Metal_Etcher/Aluminium|Etching of Al by dry etch]] | ||
*[[/IBE⁄IBSD Ionfab 300|IBE/IBSD Ionfab 300]] | *[[/IBE⁄IBSD Ionfab 300|IBE/IBSD Ionfab 300|Sputtering of Al]] | ||
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Revision as of 09:52, 12 March 2013
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Etching of Aluminium
Etching of aluminium can be done either by wet etch, dry etch or by sputtering with ions.
Comparison methode 1 and methode 2 for the process
| Methode 1 | Methode 2 | |
|---|---|---|
| Generel description | Generel description - methode 1 | Generel description - methode 2 |
| Parameter 1 |
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| Parameter 2 |
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| Substrate size |
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| Allowed materials |
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