Specific Process Knowledge/Etch/Etching of Aluminium: Difference between revisions
Appearance
No edit summary |
|||
| Line 5: | Line 5: | ||
==Etching of Aluminium== | ==Etching of Aluminium== | ||
Etching of aluminium can be done either by wet etch, dry etch or by sputtering with ions. | |||
*[[/Deposition of silicon nitride using LPCVD|Etching of Al by wet etch: 1]] | |||
*[[/Deposition of silicon nitride using LPCVD| | *[[/Deposition of silicon nitride using LPCVD|Etching of Al by wet etch: 2]] | ||
*[[/Deposition of silicon nitride using LPCVD|Etching of Al by dry etch]] | |||
*[[/Deposition of silicon nitride using LPCVD|Etching of Al by sputering]] | |||
*[[/Deposition of silicon nitride using LPCVD| | |||
<br clear="all" /> | <br clear="all" /> | ||