Specific Process Knowledge/Thin film deposition/Deposition of Silicon Nitride: Difference between revisions
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*Very low | *Very low | ||
(stoichiometric nitride: 0.75 nm/min) | (stoichiometric nitride: ~0.75 nm/min. Morten Bo Mikkelsen, March 2013) | ||
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*Very high compared the LPCVD nitride | *Very high compared the LPCVD nitride | ||