Specific Process Knowledge/Thin film deposition/Deposition of Aluminium: Difference between revisions
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|10Å/s to 15Å/s | |10Å/s to 15Å/s | ||
|About 1Å/s | |About 1Å/s | ||
|Dependent on process parameters | |Dependent on [[/Sputter rates for Al PVD co-sputter/evaporation|process parameters]] (about 1 Å/s). | ||
|Depending on process parameters (see [[/Sputter rates for Al|here]]), up to ~2.5 Å/s | |Depending on process parameters (see [[/Sputter rates for Al|here]]), up to ~2.5 Å/s | ||
|~2Å/s to 15Å/s | |~2Å/s to 15Å/s | ||