Specific Process Knowledge/Characterization: Difference between revisions
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*Prism Coupler | *Prism Coupler | ||
===[[SIMS: Secondary Ion Mass Spectrometry]]=== | ===[[SIMS: Secondary Ion Mass Spectrometry]]=== | ||
*Atomika SIMS | |||
===Drop Shape Analyser=== | ===Drop Shape Analyser=== | ||
===4-Point Probe=== | ===4-Point Probe=== | ||
===Stylus Thickness Measure=== | ===Stylus Thickness Measure=== |
Revision as of 12:07, 2 October 2007
Choose topic
- Surface imaging
- Topographic measurement
- Stress measurement
- Filmthickness measurement
- Element analysis
- Measurement of optical constants
- Hydrophobicity measurement
- Resistivity measurement
- Wafer thickness measurement
Choose equipment
SEM: Scanning Electron Microscopy
- LEO SEM
- FEI SEM
- JEOL SEM
AFM: Atomic Force Microscopy
- Nanoman - AFM - can be used for nanomanipulation
Profiler
- Tencor
- Dektak 8 stylus profiler
Optical microscope
Optical characterization
- Ellipsometer
- Filmtek
- Prism Coupler
SIMS: Secondary Ion Mass Spectrometry
- Atomika SIMS