Specific Process Knowledge/Thermal Process/Furnace Noble: Difference between revisions
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==Noble | ==Noble furnace== | ||
This furnace is used to grow oxide on metals or dirty wafers and to anneal wafers up to 1000 degree Celsius. | This furnace is used to grow oxide on metals or dirty wafers and to anneal wafers up to 1000 degree Celsius. | ||
The Noble | The Noble furnace is located in service room 3. | ||
[[Image:Noble.JPG|thumb|300x300px|A1 Bor Drive-in furnace. Positioned in cleanroom 2]] | [[Image:Noble.JPG|thumb|300x300px|A1 Bor Drive-in furnace. Positioned in cleanroom 2]] | ||
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'''The user manual, technical information and contact information can be found in LabManager:''' | '''The user manual, technical information and contact information can be found in LabManager:''' | ||
'''[http://www.labmanager.danchip.dtu.dk/function.php?module=Machine&view=view&mach=150 | '''[http://www.labmanager.danchip.dtu.dk/function.php?module=Machine&view=view&mach=150 Noble furnace]''' | ||
==Overview of the performance of the Noble Furnace== | ==Overview of the performance of the Noble Furnace== | ||
Revision as of 14:38, 14 February 2013
Noble furnace
This furnace is used to grow oxide on metals or dirty wafers and to anneal wafers up to 1000 degree Celsius. The Noble furnace is located in service room 3.
The user manual, technical information and contact information can be found in LabManager:
Overview of the performance of the Noble Furnace
| Purpose | Oxide growth, annealing | |
|---|---|---|
| Process parameter range | Process Temperature |
|
| Process pressure |
| |
| Gasses on the system |
| |
| Substrates | Batch size |
|
| Substrate material allowed |
|