Specific Process Knowledge/Thermal Process/C4 Aluminium Anneal furnace: Difference between revisions
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== | '''Feedback to this page''': '''[mailto:labadviser@danchip.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.danchip.dtu.dk/index.php/Specific_Process_Knowledge/Thermal_Process/C4_Aluminium_Anneal_furnace click here]''' | ||
==Aluminium Anneal furnace (C4)== | |||
[[Image:C4helstak.jpg |thumb|300x300px|C4 Aluminium Anneal furnace. Positioned in cleanroom 2]] | [[Image:C4helstak.jpg |thumb|300x300px|C4 Aluminium Anneal furnace. Positioned in cleanroom 2]] | ||
The | The Aluminium Anneal furnace (C4) is a Tempress horizontal furnace for annealing of silicon wafers with aluminium. | ||
This furnace is the lowest of the furnace tubes in the furnace C-stack positioned in cleanroom 2. In this furnace it is allowed to enter wafers that contain aluminium. Check the [http://www.labmanager.danchip.dtu.dk/view_binary.php?fileId=1250 cross contamination chart]. | This furnace is the lowest of the furnace tubes in the furnace C-stack positioned in cleanroom 2. In this furnace it is allowed to enter wafers that contain aluminium. Check the [http://www.labmanager.danchip.dtu.dk/view_binary.php?fileId=1250 cross contamination chart]. | ||
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'''The user manual, technical information and contact information can be found in LabManager:''' | '''The user manual, technical information and contact information can be found in LabManager:''' | ||
'''[http://www.labmanager.danchip.dtu.dk/function.php?module=Machine&view=view&mach=90 | '''[http://www.labmanager.danchip.dtu.dk/function.php?module=Machine&view=view&mach=90 Aluminium Anneal furnace (C4)]''' | ||
==Process knowledge== | ==Process knowledge== | ||
Revision as of 14:37, 14 February 2013
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Aluminium Anneal furnace (C4)
The Aluminium Anneal furnace (C4) is a Tempress horizontal furnace for annealing of silicon wafers with aluminium.
This furnace is the lowest of the furnace tubes in the furnace C-stack positioned in cleanroom 2. In this furnace it is allowed to enter wafers that contain aluminium. Check the cross contamination chart.
The user manual, technical information and contact information can be found in LabManager:
Process knowledge
- Annealing: look at the Annealing page
| Purpose | Annealing | Annealing of wafers containing aluminium. |
|---|---|---|
| Performance | Film thickness | |
| Process parameter range | Process Temperature |
|
| Process pressure |
| |
| Gas flows |
| |
| Substrates | Batch size |
|
| Substrate material allowed |
Silicon wafers with alluminium. Wafers are allowed after alluminium lift off or after alluminium etch and resiststrip in acetone |