Specific Process Knowledge/Thermal Process/C4 Aluminium Anneal furnace: Difference between revisions
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== | '''Feedback to this page''': '''[mailto:labadviser@danchip.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.danchip.dtu.dk/index.php/Specific_Process_Knowledge/Thermal_Process/C4_Aluminium_Anneal_furnace click here]''' | ||
==Aluminium Anneal furnace (C4)== | |||
[[Image:C4helstak.jpg |thumb|300x300px|C4 Aluminium Anneal furnace. Positioned in cleanroom 2]] | [[Image:C4helstak.jpg |thumb|300x300px|C4 Aluminium Anneal furnace. Positioned in cleanroom 2]] | ||
The | The Aluminium Anneal furnace (C4) is a Tempress horizontal furnace for annealing of silicon wafers with aluminium. | ||
This furnace is the lowest of the furnace tubes in the furnace C-stack positioned in cleanroom 2. In this furnace it is allowed to enter wafers that contain aluminium. Check the [http://www.labmanager.danchip.dtu.dk/view_binary.php?fileId=1250 cross contamination chart]. | This furnace is the lowest of the furnace tubes in the furnace C-stack positioned in cleanroom 2. In this furnace it is allowed to enter wafers that contain aluminium. Check the [http://www.labmanager.danchip.dtu.dk/view_binary.php?fileId=1250 cross contamination chart]. | ||
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'''The user manual, technical information and contact information can be found in LabManager:''' | '''The user manual, technical information and contact information can be found in LabManager:''' | ||
'''[http://www.labmanager.danchip.dtu.dk/function.php?module=Machine&view=view&mach=90 | '''[http://www.labmanager.danchip.dtu.dk/function.php?module=Machine&view=view&mach=90 Aluminium Anneal furnace (C4)]''' | ||
==Process knowledge== | ==Process knowledge== | ||