Specific Process Knowledge/Etch/Wet Silicon Oxide Etch (BHF): Difference between revisions
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In plastic beaker or PP-bath in the fume hood in cleanroom 2: | In plastic beaker or PP-bath in the fume hood in cleanroom 2: | ||
*All materials | *All materials | ||
HF-bath in RCA bench: | |||
*Only wafers that are being RCA cleaned | *Only wafers that are being RCA cleaned | ||
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