Specific Process Knowledge/Characterization: Difference between revisions

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===[[AFM: Atomic Force Microscopy]]===
===[[AFM: Atomic Force Microscopy]]===
*Nanoman - ''AFM - can be used for nanomanipulation''
===[[Profiler]]===
===[[Profiler]]===
*Tencor
*Tencor

Revision as of 12:06, 2 October 2007

Choose topic

  • Surface imaging
  • Topographic measurement
  • Stress measurement
  • Filmthickness measurement
  • Element analysis
  • Measurement of optical constants
  • Hydrophobicity measurement
  • Resistivity measurement
  • Wafer thickness measurement


Choose equipment

SEM: Scanning Electron Microscopy

  • LEO SEM
  • FEI SEM
  • JEOL SEM

AFM: Atomic Force Microscopy

  • Nanoman - AFM - can be used for nanomanipulation

Profiler

Optical microscope

Optical characterization

  • Ellipsometer
  • Filmtek
  • Prism Coupler

SIMS: Secondary Ion Mass Spectrometry

Drop Shape Analyser

4-Point Probe

Stylus Thickness Measure

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