Jump to content

Specific Process Knowledge/Etch/Wet Silicon Oxide Etch (BHF): Difference between revisions

Kb (talk | contribs)
Kb (talk | contribs)
Line 18: Line 18:
|-  
|-  
|'''General description'''
|'''General description'''
| {|valign="top"
|-valign="top"
Etching of silicon oxide with a stable etch rate
Etching of silicon oxide with a stable etch rate
|
|