Specific Process Knowledge/Etch/IBE⁄IBSD Ionfab 300/IBE Si etch: Difference between revisions
Appearance
| Line 1: | Line 1: | ||
=Results for Si etching in the IBE= | =Results for Si etching in the IBE= | ||
''Made by Kristian Hagsted Rasmussen @ Nanotech'' <br\> | ''Made by Kristian Hagsted Rasmussen @ Nanotech'' in 2012 <br\> | ||
Best recipe with respect to the etch profile and low redeposition: | Best recipe with respect to the etch profile and low redeposition: | ||
| Line 40: | Line 40: | ||
|17-18 | |17-18 | ||
|} | |} | ||
=Etch results= | =Etch results= | ||
===Some SEM profile images of the etched stacks=== | ===Some SEM profile images of the etched stacks=== | ||