Specific Process Knowledge/Lithography: Difference between revisions

@@ Line 24: / Line 24: @@
 |-style="background:silver; color:black"
 !
-![[Specific Process Knowledge/Thin film deposition/Furnace LPCVD Nitride|Photolithography]]
+![[Specific Process Knowledge/Thin film deposition/Furnace LPCVD Nitride|UV Lithography]]
 ![[Specific Process Knowledge/Thin film deposition/PECVD|DUV Lithography]]
 ![[Specific Process Knowledge/Thin film deposition/PECVD|E-beam Lithography]]
@@ Line 54: / Line 54: @@
 *~20nm and up
 |
-*3D ?nm
+*3D: 0.3 µm spot; 1.3 µm high
 |-
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 *UV sensitive:
 **AZ
-**SU8
+**SU-8
 |
 *DUV sensitive
@@ Line 72: / Line 72: @@
 **ZEP502A (positive)
 **HSQ (negative)
-**SU8
+**SU-8
 |
 *Imprint polymers:
 **??
 |
-*UV sensitive:
+*UV cross-linking:
-**IP-L
+**IP photoresists
-**IP-G
+**SU-8
 |-
 |-