Specific Process Knowledge/Lithography: Difference between revisions
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== | ==Comparing lithography methods at Danchip== | ||
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!Generel description | !Generel description | ||
|Generel description - | |Generel description - method 1 | ||
|Generel description - | |Generel description - method 2 | ||
|3 | |3 | ||
|4 | |4 | ||
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**?? | **?? | ||
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* | *UV sensitive: | ||
** | **IP-L | ||
**IP-G | |||
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*<nowiki>#</nowiki> 150 mm wafers | *<nowiki>#</nowiki> 150 mm wafers | ||
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*<nowiki>#</nowiki> | *<nowiki>#</nowiki> Microscope cover slides | ||
*<nowiki>#</nowiki> 50 mm wafers | *<nowiki>#</nowiki> 50 mm wafers | ||
*<nowiki>#</nowiki> 100 mm wafers | *<nowiki>#</nowiki> 100 mm wafers | ||
*<nowiki>#</nowiki> | *<nowiki>#</nowiki> IBIDI | ||
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