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Specific Process Knowledge/Characterization/Sample imaging: Difference between revisions

Line 162: Line 162:
*Silicon,silion oxide, silicon nitride
*Silicon,silion oxide, silicon nitride
*Quartz, polymers and photoresist
*Quartz, polymers and photoresist
*Metals (except type 4)
*Metals (except type IV)
*III-V materials
*III-V materials
*Graphene and carbon nanotubes
*Graphene and carbon nanotubes
Line 169: Line 169:
*Quartz, glass
*Quartz, glass
*Polymers and photoresist
*Polymers and photoresist
*Metals (except type 4)
*Metals (except type IV)
*III-V materials
*III-V materials
*Graphene and carbon nanotubes
*Graphene and carbon nanotubes
Line 176: Line 176:
*Quartz, glass
*Quartz, glass
*polymers and photoresist (outbaked)
*polymers and photoresist (outbaked)
*Metals (except type 4)
*Metals (except type IV)
*III-V materials  
*III-V materials  
*Graphene and carbon nanotubes  
*Graphene and carbon nanotubes  
Line 184: Line 184:
*Quartz, glass
*Quartz, glass
*Polymers and photoresist  
*Polymers and photoresist  
*Metals (except type 4)
*Metals (except type IV)
*III-V materials  
*III-V materials  
*Graphene and carbon nanotubes  
*Graphene and carbon nanotubes  
Line 191: Line 191:
*Quartz, glass
*Quartz, glass
*Polymers and photoresist
*Polymers and photoresist
*Metals (except type 4)
*Metals (except type IV)
*III-V materials  
*III-V materials  
*Graphene and carbon nanotubes  
*Graphene and carbon nanotubes