Specific Process Knowledge/Characterization/Sample imaging: Difference between revisions
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*Silicon,silion oxide, silicon nitride | *Silicon,silion oxide, silicon nitride | ||
*Quartz, polymers and photoresist | *Quartz, polymers and photoresist | ||
*Metals (except type | *Metals (except type IV) | ||
*III-V materials | *III-V materials | ||
*Graphene and carbon nanotubes | *Graphene and carbon nanotubes | ||
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*Quartz, glass | *Quartz, glass | ||
*Polymers and photoresist | *Polymers and photoresist | ||
*Metals (except type | *Metals (except type IV) | ||
*III-V materials | *III-V materials | ||
*Graphene and carbon nanotubes | *Graphene and carbon nanotubes | ||
| Line 176: | Line 176: | ||
*Quartz, glass | *Quartz, glass | ||
*polymers and photoresist (outbaked) | *polymers and photoresist (outbaked) | ||
*Metals (except type | *Metals (except type IV) | ||
*III-V materials | *III-V materials | ||
*Graphene and carbon nanotubes | *Graphene and carbon nanotubes | ||
| Line 184: | Line 184: | ||
*Quartz, glass | *Quartz, glass | ||
*Polymers and photoresist | *Polymers and photoresist | ||
*Metals (except type | *Metals (except type IV) | ||
*III-V materials | *III-V materials | ||
*Graphene and carbon nanotubes | *Graphene and carbon nanotubes | ||
| Line 191: | Line 191: | ||
*Quartz, glass | *Quartz, glass | ||
*Polymers and photoresist | *Polymers and photoresist | ||
*Metals (except type | *Metals (except type IV) | ||
*III-V materials | *III-V materials | ||
*Graphene and carbon nanotubes | *Graphene and carbon nanotubes | ||