Specific Process Knowledge/Characterization/Sample imaging: Difference between revisions
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Deposition of silicon nitride can be done with either LPCVD (Low Pressure Chemical Vapor Deposition) or PECVD (Plasma Enhanced Chemical Vapor Deposition). Stiochiometric nitride or silicon rich (low stress) LPCVD nitride is deposited on a batch of wafers in a LPCVD nitride furnace, and PECVD nitride (or oxynitride) is deposited on a few samples at a time in a PECVD system. LPCVD nitride has a good step coverage and a very good uniformity. Using PECVD it is possible to deposit a thicker layer of nitride on different types of samples, but the nitride does not cover sidewalls very well. | Deposition of silicon nitride can be done with either LPCVD (Low Pressure Chemical Vapor Deposition) or PECVD (Plasma Enhanced Chemical Vapor Deposition). Stiochiometric nitride or silicon rich (low stress) LPCVD nitride is deposited on a batch of wafers in a LPCVD nitride furnace, and PECVD nitride (or oxynitride) is deposited on a few samples at a time in a PECVD system. LPCVD nitride has a good step coverage and a very good uniformity. Using PECVD it is possible to deposit a thicker layer of nitride on different types of samples, but the nitride does not cover sidewalls very well. | ||
*[[/ | *[[Specific_Process_Knowledge/Characterization/Optical_microscope|Sample imaging using optical microscopes]] | ||
*[[/ | *[[Specific_Process_Knowledge/Characterization/Profiler#Optical_Profiler_.28Sensofar.29|Sample imaging using optical profiler]] | ||
*[[/ | *[[Specific_Process_Knowledge/Characterization/SEM:_Scanning_Electron_Microscopy|Sample imaging using SEM]] | ||
*[[/ | *[[Specific_Process_Knowledge/Characterization/AFM:_Atomic_Force_Microscopy|Sample imaging using AFM]] | ||
*[[/ | *[[Specific_Process_Knowledge/Characterization/Profiler#Dektak_XTA_new_stylus_profiler|Sample imaging using stylus profiler (Dektak)]] | ||
==Comparison of optical microscopes, optical profiler, SEM and AFM for sample imaging== | ==Comparison of optical microscopes, optical profiler, SEM and AFM for sample imaging== | ||