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Specific Process Knowledge/Etch/Etching of Silicon: Difference between revisions

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!Generel description
!Generel description
|Generel description - methode 1
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|Generel description - methode 2
*Anisotropic etch in the (100)-plan
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*High selectivity to the other plans
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*Anisotropic etch: vertical sidewalls independent of the crystal plans
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*Isotropic etch in Silicon and Polysilicon
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*Can etch isotropic and anisotropic depending on the process parameters
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*As RIE but better for high aspect ratio etching and deep etches (higher etch rate)
*Good selectivity to photoresist
 
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