Specific Process Knowledge/Etch/DRIE-Pegasus/processA: Difference between revisions
| Line 116: | Line 116: | ||
! width="70" |Wafer number | ! width="70" |Wafer number | ||
! width="70" |Mask | ! width="70" |Mask | ||
! width="70" |Mask material | |||
! Process A duration | ! Process A duration | ||
|- | |- | ||
| C01548.01 | | C01548.01 | ||
| Travka 05 | | Travka 05 | ||
| AZ photoresist | |||
| 55 cycles, 10:05 mins | | 55 cycles, 10:05 mins | ||
|- | |- | ||
| C01548.02 | | C01548.02 | ||
| Travka 10 | | Travka 10 | ||
| AZ photoresist | |||
| 55 cycles, 10:05 mins | | 55 cycles, 10:05 mins | ||
|- | |- | ||
| C01548.03 | | C01548.03 | ||
| Travka 20 | | Travka 20 | ||
| AZ photoresist | |||
| 55 cycles, 10:05 mins | | 55 cycles, 10:05 mins | ||
|- | |- | ||
| C01548.04 | | C01548.04 | ||
| Travka 35 | | Travka 35 | ||
| AZ photoresist | |||
| 55 cycles, 10:05 mins | | 55 cycles, 10:05 mins | ||
|- | |- | ||
| C01548.05 | | C01548.05 | ||
| Travka 50 | | Travka 50 | ||
| AZ photoresist | |||
| 55 cycles, 10:05 mins | | 55 cycles, 10:05 mins | ||
|} | |} | ||
| Line 148: | Line 154: | ||
| C01549.01 | | C01549.01 | ||
| Travka 05 | | Travka 05 | ||
| 600 nm oxide | |||
| 110 cycles, 20:10 mins | | 110 cycles, 20:10 mins | ||
|- | |- | ||
| C01549.02 | | C01549.02 | ||
| Travka 10 | | Travka 10 | ||
| 600 nm oxide | |||
| 110 cycles, 20:10 mins | | 110 cycles, 20:10 mins | ||
|- | |- | ||
| C01549.03 | | C01549.03 | ||
| Travka 20 | | Travka 20 | ||
| 600 nm oxide | |||
| 110 cycles, 20:10 mins | | 110 cycles, 20:10 mins | ||
|- | |- | ||
| C01549.04 | | C01549.04 | ||
| Travka 35 | | Travka 35 | ||
| 600 nm oxide | |||
| 110 cycles, 20:10 mins | | 110 cycles, 20:10 mins | ||
|} | |} | ||
|} | |} | ||