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Specific Process Knowledge/Lithography: Difference between revisions

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Bureaucrats, danchip, Administrators
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2,908 edits
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|-style="background:WhiteSmoke; color:black"
|-style="background:WhiteSmoke; color:black"
!Exposure time
!Typical exposure time
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*UV sensitive:
2s-30s pr. wafer
**AZ
**SU8
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*DUV sensitive
?-? pr. ?
**fff
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*E-beam sensitive
?-? pr. µm2
**ZEP502A
**SU8
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*Imprint polymers:
? pr. wafer
**??
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*?? sensitive:
? pr. µm2
**??
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