Specific Process Knowledge/Thin film deposition/Deposition of Silicon Nitride: Difference between revisions
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*[[/Deposition of silicon nitride using PECVD|Nitride deposition using PECVD]] (''or oxynitride'') | *[[/Deposition of silicon nitride using PECVD|Nitride deposition using PECVD]] (''or oxynitride'') | ||
*[[/Deposition of silicon nitride using Lesker sputter system|Nitride deposition using Lesker sputter system]] | |||
==Comparison of LPCVD and PECVD for silicon nitride deposition== | ==Comparison of LPCVD and PECVD for silicon nitride deposition== | ||