Specific Process Knowledge/Lithography: Difference between revisions

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!
!
![[Specific Process Knowledge/Thin film deposition/Furnace LPCVD Nitride|Methode 1]]
![[Specific Process Knowledge/Thin film deposition/Furnace LPCVD Nitride|Photolithography]]
![[Specific Process Knowledge/Thin film deposition/PECVD|Methode 2]]
![[Specific Process Knowledge/Thin film deposition/PECVD|DUV Lithography]]
![[Specific Process Knowledge/Thin film deposition/PECVD|E-beam Lithography]]
![[Specific Process Knowledge/Thin film deposition/PECVD|Imprint Lithograph]]
![[Specific Process Knowledge/Thin film deposition/PECVD|Two photon Lithography]]
 
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|Generel description - methode 1
|Generel description - methode 1
|Generel description - methode 2
|Generel description - methode 2
|3
|4
|5
|-
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|-style="background:LightGrey; color:black"
!Parameter 1
!Parameter 1
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*A
*B
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*A
*B
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*A
*B
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|
*A
*A
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*A
*A
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*3
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*4
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*5
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*<nowiki>#</nowiki> 100 mm wafers
*<nowiki>#</nowiki> 100 mm wafers
*<nowiki>#</nowiki> 150 mm wafers  
*<nowiki>#</nowiki> 150 mm wafers  
|-
|
 
*<nowiki>#</nowiki> small samples
*<nowiki>#</nowiki> 50 mm wafers
*<nowiki>#</nowiki> 100 mm wafers
*<nowiki>#</nowiki> 150 mm wafers
|
*<nowiki>#</nowiki> small samples
*<nowiki>#</nowiki> 50 mm wafers
*<nowiki>#</nowiki> 100 mm wafers
*<nowiki>#</nowiki> 150 mm wafers
|
*<nowiki>#</nowiki> small samples
*<nowiki>#</nowiki> 50 mm wafers
*<nowiki>#</nowiki> 100 mm wafers
*<nowiki>#</nowiki> 150 mm wafers
|-
|-
|-style="background:WhiteSmoke; color:black"
|-style="background:WhiteSmoke; color:black"
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*Allowed material 1  
*Allowed material 1  
*Allowed material 2
*Allowed material 2
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*Allowed material 1
*Allowed material 2
*Allowed material 3
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*Allowed material 1
*Allowed material 2
*Allowed material 3
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*Allowed material 1
*Allowed material 2
*Allowed material 3
|
|
*Allowed material 1  
*Allowed material 1  

Revision as of 10:38, 31 January 2013

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Comparing Lithography methodes at Danchip

There are a broad varity of lithography methodes at Danchip. The methodes are compared here to make it easier for you to compare and choose the one that suits your needs.

Comparison methode 1 and methode 2 for the process

Photolithography DUV Lithography E-beam Lithography Imprint Lithograph Two photon Lithography
Generel description Generel description - methode 1 Generel description - methode 2 3 4 5
Parameter 1
  • A
  • B
  • A
  • B
  • A
  • B
  • A
  • B
  • A
  • B
Parameter 2
  • A
  • B
  • C
  • A
  • 3
  • 4
  • 5
Substrate size
  • # small samples
  • # 50 mm wafers
  • # 100 mm wafers
  • # 150 mm wafers
  • # small samples
  • # 50 mm wafers
  • # 100 mm wafers
  • # 150 mm wafers
  • # small samples
  • # 50 mm wafers
  • # 100 mm wafers
  • # 150 mm wafers
  • # small samples
  • # 50 mm wafers
  • # 100 mm wafers
  • # 150 mm wafers
  • # small samples
  • # 50 mm wafers
  • # 100 mm wafers
  • # 150 mm wafers
Allowed materials
  • Allowed material 1
  • Allowed material 2
  • Allowed material 1
  • Allowed material 2
  • Allowed material 3
  • Allowed material 1
  • Allowed material 2
  • Allowed material 3
  • Allowed material 1
  • Allowed material 2
  • Allowed material 3
  • Allowed material 1
  • Allowed material 2
  • Allowed material 3


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