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Specific Process Knowledge/Etch/DRIE-Pegasus/processB: Difference between revisions

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Bureaucrats, danchip, Administrators
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Bureaucrats, danchip, Administrators
1,918 edits
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! width="70" |Wafer number
! width="70" |Wafer number
! width="70" |Mask
! width="70" |Mask
! width="100" |Process B duration
! Process B duration
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<gallery caption="The results of process B after 17 and 34 cycles of etching"  widths="400" heights="250" perrow="2">
<gallery caption="The results of process B after 17 and 34 cycles of etching"  widths="500" heights="250" perrow="2">
image:Travkatesting1a.jpg|  
image:Travkatesting1a.jpg|  
image:Travkatesting1b.jpg|The 60 nm trenches
image:Travkatesting1b.jpg|The 60 nm trenches
</gallery>
</gallery>
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