Specific Process Knowledge/Etch/DRIE-Pegasus/processB: Difference between revisions
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=== Results === | === Results === | ||
<gallery caption="The results of the nano1.0 recipe" widths=" | A number of wafers are patterned with the [[Specific Process Knowledge/Photolithography/masks/travka|travka masks]]. | ||
<gallery caption="The results of the nano1.0 recipe" widths="300" perrow="2"> | |||
image:Travkatesting1a.jpg| | image:Travkatesting1a.jpg| | ||
image:Travkatesting1b.jpg|The 60 nm trenches | image:Travkatesting1b.jpg|The 60 nm trenches | ||
</gallery> | </gallery> | ||