Specific Process Knowledge/Characterization/SEM: Scanning Electron Microscopy: Difference between revisions
No edit summary |
No edit summary |
||
| Line 7: | Line 7: | ||
The popularity and need for the [[/Leo|Leo SEM]] is however such that a 'maximum 2 hour per session' policy is necessary - so it may be difficult to get access to it. The less advanced [[/Jeol|Jeol SEM]] offers a great alternative for many types of SEM needs. If you have to check the result of an etch process, a lift-off etc. before you proceed with the process sequence, the [[/Jeol|Jeol SEM]] is a much better choice. It is simple, faster to use, has a very low sample exchange time and is by far more accessible than the Leo SEM. There is a very good chance that it is free when you need it. On heavily charging polymers such as SU-8 it even does a better job. To use it, a 1-2 hour training session is necessary. | The popularity and need for the [[/Leo|Leo SEM]] is however such that a 'maximum 2 hour per session' policy is necessary - so it may be difficult to get access to it. The less advanced [[/Jeol|Jeol SEM]] offers a great alternative for many types of SEM needs. If you have to check the result of an etch process, a lift-off etc. before you proceed with the process sequence, the [[/Jeol|Jeol SEM]] is a much better choice. It is simple, faster to use, has a very low sample exchange time and is by far more accessible than the Leo SEM. There is a very good chance that it is free when you need it. On heavily charging polymers such as SU-8 it even does a better job. To use it, a 1-2 hour training session is necessary. | ||
The new [[/FEI|FEI SEM]] is our most advanced SEM. | The new [[/FEI|FEI SEM]] is our most advanced SEM. | ||
It is a state-of-the art microscope with two vacuum modes (High Vacuum and Low Vacuum) and 7 different detectors. | |||
It has been acquired to cope with the growing need for polymer and e-beam related imaging. | |||