Specific Process Knowledge/Characterization/SEM: Scanning Electron Microscopy: Difference between revisions
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At the moment we have three SEM's. Together they cover a wide range of needs in the cleanroom: From the fast in-process verification of different process parameters such as etch rates, step coverages or lift-off quality to the ultra high resolution images on any type of sample intended for publication. | At the moment we have three SEM's. Together they cover a wide range of needs in the cleanroom: From the fast in-process verification of different process parameters such as etch rates, step coverages or lift-off quality to the ultra high resolution images on any type of sample intended for publication. | ||
The SEM that will cover most users needs is the [[/Leo|Leo SEM]]. It is a very reliable and rugged | The SEM that will cover most users needs is the [[/Leo|Leo SEM]]. It is a very reliable and rugged field emission instrument that provides high quality images of most samples. Due to its robustness new users only need a mandatory two hour training session | ||
before they are free to use it by themselves. | |||
==[[/FEI | FEI SEM]] - ''FEI Nova 600 NanoSEM'' == | ==[[/FEI | FEI SEM]] - ''FEI Nova 600 NanoSEM'' == | ||
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==[[/Jeol | Jeol SEM]] - ''Jeol JSM 5500 LV '' == | ==[[/Jeol | Jeol SEM]] - ''Jeol JSM 5500 LV '' == | ||
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Revision as of 16:38, 24 November 2007
At the moment we have three SEM's. Together they cover a wide range of needs in the cleanroom: From the fast in-process verification of different process parameters such as etch rates, step coverages or lift-off quality to the ultra high resolution images on any type of sample intended for publication.
The SEM that will cover most users needs is the Leo SEM. It is a very reliable and rugged field emission instrument that provides high quality images of most samples. Due to its robustness new users only need a mandatory two hour training session before they are free to use it by themselves.