Specific Process Knowledge/Characterization/SEM: Scanning Electron Microscopy: Difference between revisions
No edit summary |
No edit summary |
||
Line 1: | Line 1: | ||
At the moment we have three SEM's. Together they cover a wide range of needs in the cleanroom: From the fast in-process verification of different process parameters such as etch rates, step coverages or lift-off quality to the ultra high resolution images on any type of sample intended for publication. | At the moment we have three SEM's. Together they cover a wide range of needs in the cleanroom: From the fast in-process verification of different process parameters such as etch rates, step coverages or lift-off quality to the ultra high resolution images on any type of sample intended for publication. | ||
==[[/FEI | FEI SEM]] - ''FEI Nova 600 NanoSEM''== | |||
=LEO SEM= | =LEO SEM= | ||
=JEOL SEM= | =JEOL SEM= |
Revision as of 16:14, 24 November 2007
At the moment we have three SEM's. Together they cover a wide range of needs in the cleanroom: From the fast in-process verification of different process parameters such as etch rates, step coverages or lift-off quality to the ultra high resolution images on any type of sample intended for publication.