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Specific Process Knowledge/Etch/ICP Metal Etcher/silicon/nano/Sinano31: Difference between revisions

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Created page with "== The Sinano3.1 recipe == {| border="2" cellpadding="2" cellspacing="1" |+ '''Recipe Sinano3.1''' |- ! rowspan="6" align="center"| Recipe | Gas | BCl<sub>3</sub> 3 sccm, HB..."
 
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| Mask
| Mask
| 180 nm zep etched down to 96 nm
| The [[Specific Process Knowledge/Etch/ICP Metal Etcher/silicon/nano/nanoetch/180nmzep|180 nm zep resist]] etched down to 96 nm
|-  
|-  
| Wafer
| Wafer
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