Specific Process Knowledge/Etch/ICP Metal Etcher/silicon/nano: Difference between revisions
Appearance
| Line 30: | Line 30: | ||
![[Specific Process Knowledge/Etch/ICP Metal Etcher/silicon/nano/Sinan331|3.31]] | ![[Specific Process Knowledge/Etch/ICP Metal Etcher/silicon/nano/Sinan331|3.31]] | ||
![[Specific Process Knowledge/Etch/ICP Metal Etcher/silicon/nano/Sinan331-2|3.31]] | ![[Specific Process Knowledge/Etch/ICP Metal Etcher/silicon/nano/Sinan331-2|3.31]] | ||
![[Specific Process Knowledge/Etch/ICP Metal Etcher/Sinan332|3.32]] | ![[Specific Process Knowledge/Etch/ICP Metal Etcher/silicon/nano/Sinan332|3.32]] | ||
|- | |- | ||
!Cl<sub>2</sub> (sccm) | !Cl<sub>2</sub> (sccm) | ||