Specific Process Knowledge/Etch/ICP Metal Etcher: Difference between revisions
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{| | {| | ||
| | | SF<sub>6</sub>: 0-100 sccm | ||
| | | O<sub>2</sub>: 0-100 sccm | ||
|- | |- | ||
| | | C<sub>4</sub>F<sub>8</sub>: 0-100 sccm | ||
| | | Ar: 0-100 sccm | ||
|- | |- | ||
| | | CF<sub>4</sub>: 0-100 sccm | ||
| | | H<sub>2</sub>: 0-30 sccm | ||
|- | |- | ||
| | | CH<sub>4</sub>: 0-50 sccm | ||
| | | BCl<sub>3</sub>: 0-100 sccm | ||
|- | |- | ||
| | | Cl<sub>2</sub>: 0-100 sccm | ||
| | | HBr: 0-100 sccm | ||
|} | |} | ||
|- | |- | ||