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Specific Process Knowledge/Etch/ICP Metal Etcher: Difference between revisions

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|style="background:WhiteSmoke; color:black"|
{|
{|
| *SF<sub>6</sub>: 0-100 sccm
| * SF<sub>6</sub>: 0-100 sccm
| *O<sub>2</sub>: 0-100 sccm
| * O<sub>2</sub>: 0-100 sccm
|-
|-
| *C<sub>4</sub>F<sub>8</sub>: 0-100 sccm
| * C<sub>4</sub>F<sub>8</sub>: 0-100 sccm
| *Ar: 0-100 sccm
| * Ar: 0-100 sccm
|-
|-
| *CF<sub>4</sub>: 0-100 sccm
| * CF<sub>4</sub>: 0-100 sccm
| *H<sub>2</sub>: 0-30 sccm
| * H<sub>2</sub>: 0-30 sccm
|-
|-
| *CH<sub>4</sub>: 0-50 sccm
| * CH<sub>4</sub>: 0-50 sccm
| *BCl<sub>3</sub>: 0-100 sccm
| * BCl<sub>3</sub>: 0-100 sccm
|-
|-
| *Cl<sub>2</sub>: 0-100 sccm
| * Cl<sub>2</sub>: 0-100 sccm
| *HBr: 0-100 sccm
| * HBr: 0-100 sccm
|}
|}
|-
|-
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