Specific Process Knowledge/Etch/ASE (Advanced Silicon Etch): Difference between revisions

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 |style="background:LightGrey; color:black"|Dry etch of
 |style="background:WhiteSmoke; color:black"|
-*Silicon
+* Silicon
+* Polymers such as polyimide, PDMS, PMMA, BCB and resists
 |-
 !style="background:silver; color:black" align="left" valign="top" rowspan="2"|Performance
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 |style="background:LightGrey; color:black"|Gas flows
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-*SF<math>_6</math>: 0-600 sccm
+*SF<sub>_6</sub>: 0-600 sccm
-*O<math>_2</math>: 0-100 sccm
+*O<sub>_2</sub>: 0-100 sccm
-*C<math>_4</math>F<math>_8</math>: 0-300 sccm
+*C<sub>_4</sub>F<sub>_8</sub>: 0-300 sccm
 *Ar: 0-100 sccm
 |-