Specific Process Knowledge/Etch: Difference between revisions
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*[[/Etching of Gold|Gold]] | *[[/Etching of Gold|Gold]] | ||
*[[/Etching of Platin|Platin]] | *[[/Etching of Platin|Platin]] | ||
*[[Specific Process Knowledge/Etch/IBE⁄IBSD Ionfab 300/IBE magnetic stack etch|Magnetic stack]] - ''containing Ta/MnIr/NiFe | *[[Specific Process Knowledge/Etch/IBE⁄IBSD Ionfab 300/IBE magnetic stack etch|Magnetic stack]] - ''containing Ta/MnIr/NiFe'' | ||
*[[/Etching of Polymer|Polymer]] | *[[/Etching of Polymer|Polymer]] | ||
*[[/Etching of Silicon|Silicon]] | *[[/Etching of Silicon|Silicon]] | ||