Specific Process Knowledge/Etch/IBE⁄IBSD Ionfab 300/IBE Si etch: Difference between revisions

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 {| border="1" cellspacing="1" cellpadding="2"
 !
-[[image:Silicon-IBE-good-b17.jpg|300x300px|thumb|center|Silicon etch in IBE with good corner definition. Small hare ears are obvious at the structure edge.]]
+[[image:IBE-Si-ER-contour.jpg|300x300px|thumb|center|Silicon etch in IBE with good corner definition. Small hare ears are obvious at the structure edge.]]
 !
-[[image:Silicon-IBE-bad-b21.jpg|300x300px|thumb|center|Silicon etch in IBE with rounded corners. Large hare ears with ripling are seen at the structure edge.]]
+[[image:IBE-Si-CA-contour.jpg|300x300px|thumb|center|Silicon etch in IBE with rounded corners. Large hare ears with ripling are seen at the structure edge.]]
 |}