Specific Process Knowledge/Thermal Process/BCB Curing Oven: Difference between revisions

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The BCB Curing Oven is mainly used for curing of BCB (bisbenzocyclobutene) and for alloying of metals in a nitrogen atmosphere.
The BCB Curing Oven is mainly used for curing of BCB (bisbenzocyclobutene) and for alloying of metals in a nitrogen atmosphere.


During processing the furnace is rapidly heated by use of five halogen lamps situated below the sample. The furnace is purged with a high or a low nitrogen flow. Samples are processed at atmospheric pressure or at vacuum.
During processing the furnace is rapidly heated by use of eight halogen lamps situated below the sample. The furnace is purged with a high or a low nitrogen flow. Samples are processed at atmospheric pressure or at vacuum.


'''The user manual, user APV, technical information and contact information can be found in LabManager:'''
'''The user manual, user APV, technical information and contact information can be found in LabManager:'''

Revision as of 12:02, 4 December 2012

BCB Curing Oven

The BCB Curing Oven is mainly used for curing of BCB (bisbenzocyclobutene) and for alloying of metals in a nitrogen atmosphere.

During processing the furnace is rapidly heated by use of eight halogen lamps situated below the sample. The furnace is purged with a high or a low nitrogen flow. Samples are processed at atmospheric pressure or at vacuum.

The user manual, user APV, technical information and contact information can be found in LabManager:

The BCB Curing Oven. Located in the III-V Lab

BCB Curing Oven

Process information

There are no standard processes on the furnace.

Equipment performance and process related parameters

Equipment BCB Curing Oven
Purpose
  • BCB curing
  • Metal alloying
Process parameter range Temperature
  • 22 - 450oC
Nitrogen flows
  • Low N2 flow: 5 SLM
  • High N2 flow: Max 16.7 SLM
Pressure
  • Atmospheric pressure or vacuum
Substrates

(Remember to use the right carrier wafer)

Batch size
  • Several small samples
  • One 50 mm wafer
  • One 100 mm wafer
Allowed materials
  • BCB
  • III-V materials
  • Co-polymer
  • Silicon, silicon oxide, silicon nitride
  • Quartz
  • Resist (prebaked)
  • Metal (only Al, Ni, Ge and Au)