Specific Process Knowledge/Thermal Process/Furnace Noble: Difference between revisions
| Line 3: | Line 3: | ||
This furnace is used to grow oxide on metals or dirty wafers and to anneal wafers up to 1000 degree Celsius. | This furnace is used to grow oxide on metals or dirty wafers and to anneal wafers up to 1000 degree Celsius. | ||
The Noble Furnace is located in service room 3. | The Noble Furnace is located in service room 3. | ||
[[Image:Noble.JPG|thumb|300x300px|A1 Bor Drive-in furnace. Positioned in cleanroom 2]] | |||
==Overview of the performance of the Noble Furnace== | ==Overview of the performance of the Noble Furnace== | ||
Revision as of 11:52, 3 December 2012
Noble Furnace
This furnace is used to grow oxide on metals or dirty wafers and to anneal wafers up to 1000 degree Celsius. The Noble Furnace is located in service room 3.
Overview of the performance of the Noble Furnace
| Purpose | Oxide growth, annealing | |
|---|---|---|
| Performance |
| |
| Process parameter range | Process Temperature |
|
| Process pressure |
| |
| Gasses on the system |
| |
| Substrates | Batch size |
|
| Substrate material allowed |
|