Specific Process Knowledge/Characterization/Optical microscope: Difference between revisions
No edit summary |
No edit summary |
||
| Line 15: | Line 15: | ||
|- | |- | ||
| | | | ||
|[[image:Zeiss Jenatech strain.jpg| | |[[image:Zeiss Jenatech strain.jpg|100x100px|thumb|left]] | ||
[[image:Zeiss Jenatech strain_1.jpg| | [[image:Zeiss Jenatech strain_1.jpg|100x100px|thumb|left]] | ||
| | | | ||
|[[image:Leica S8 APO.jpg| | |[[image:Leica S8 APO.jpg|100x100px|thumb|left]] | ||
|[[image:Zeiss_original_1.jpg| | |[[image:Zeiss_original_1.jpg|100x100px|thumb|left]] | ||
[[image:Zeiss_original_2.jpg| | [[image:Zeiss_original_2.jpg|100x100px|thumb|left]] | ||
|[[image:Leitz Medilux.jpg| | |[[image:Leitz Medilux.jpg|100x100px|thumb|left]] | ||
| | |[[image:Zeiss Axiotron.jpg|100x100px|thumb|left]] | ||
|[[image:Zeiss Jenatech particle measurement_2.jpg| | [[image:Zeiss Axiotron_1.jpg|100x100px|thumb|left]] | ||
[[image:Zeiss Jenatech particle measurement_1.jpg| | |[[image:Zeiss Jenatech particle measurement_2.jpg|100x100px|thumb|left]] | ||
|[[image:Noco IR microscope.jpg| | [[image:Zeiss Jenatech particle measurement_1.jpg|100x100px|thumb|left]] | ||
[[image:Noco IR microscope_1.jpg| | |[[image:Noco IR microscope.jpg|100x100px|thumb|left]] | ||
| | [[image:Noco IR microscope_1.jpg|100x100px|thumb|left]] | ||
||[[image:Nikon ME 600.jpg| | |[[image:Nikon SMZ 1000.jpg|100x100px|thumb|left]] | ||
[[image:Nikon ME 600_1.jpg| | ||[[image:Nikon ME 600.jpg|100x100px|thumb|left]] | ||
|[[image:Nikon Eclipse L200.jpg| | [[image:Nikon ME 600_1.jpg|100x100px|thumb|left]] | ||
[[image:Nikon Eclipse L200_1.jpg| | |[[image:Nikon Eclipse L200.jpg|100x100px|thumb|left]] | ||
|[[image:Nikon Eclipse L200 2.jpg| | [[image:Nikon Eclipse L200_1.jpg|100x100px|thumb|left]] | ||
[[image:Nikon Eclipse L200 2_1.jpg| | |[[image:Nikon Eclipse L200 2.jpg|100x100px|thumb|left]] | ||
[[image:Nikon Eclipse L200 2_1.jpg|100x100px|thumb|left]] | |||
|- | |- | ||
|'''Location''' | |'''Location''' | ||