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Specific Process Knowledge/Characterization/SEM: Scanning Electron Microscopy: Difference between revisions

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|Leo 1550 SEM
|Leo 1550 SEM
|Jeol JSM 5500 LV SEM
|Jeol JSM 5500 LV SEM
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!Electron emitter type
|FEG (Field Emission Gun)
|FEG (Field Emission Gun)
|FEG (Field Emission Gun)
|Tungsten filament
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!Vacuum modes
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|High vacuum (>2*10<math>^{-4}</math>mbar) and Low vacuum (0.1-1.9 mbar)
|High vacuum (>2*10<math>^{-5}</math>mbar)
|High vacuum and Low vacuum
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!Detectors
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|High and Low vacuum detectors of SE and BSE electrons, HiVac Inlens SE detector and high resolution Low vacuum detector
|SE, Inlens SE and BSE detectors
|High vacuum SE and BSE detector
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!Substrate size
!Substrate size
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!Best obtainable lateral resolution (strongly dependent on user skills and sample type)
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|Down to 1-2 nm (Limiting factor: Beam)
|Down to 10 nm (Limiting factor: Vibrations)
|Down to 20-30 nm (Limiting factor: Vibrations)
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!General availability
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|Good
|Poor
|Excellent
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!Ease of use
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|A sophisticated user interface with many features and many different detectors: Complicated
|A simple user interface with joystick and a limited number of detectors: Relatively simple
|A simple user interface with joystick with one detector: Very simple
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!User level access
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|Only experienced SEM users, masters/Ph.D students with special needs will be trained
|Any cleanroom user
|Any cleanroom user
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!Best usage
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|High resolution imaging of any sample
|High resolution imaging of any non-polymer sample
|Fast in-process imaging
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!EDX analysis
!EDX analysis