Jump to content

Specific Process Knowledge/Thermal Process/BCB Curing Oven: Difference between revisions

Line 22: Line 22:


!colspan="2" border="none" style="background:silver; color:black;" align="center"|Equipment
!colspan="2" border="none" style="background:silver; color:black;" align="center"|Equipment
|style="background:WhiteSmoke; color:black"|<b>Resist Pyrolysis Furnace</b>
|style="background:WhiteSmoke; color:black"|<b>BCB Curing Oven</b>
|-
|-
!style="background:silver; color:black;" align="center"|Purpose  
!style="background:silver; color:black;" align="center"|Purpose  
Line 46: Line 46:
*One 100 mm wafer
*One 100 mm wafer
|-
|-
| style="background:LightGrey; color:black"|Allowed materials
| style="background:LightGrey; color:black"|Allowed materials  
'''Use the right carrier wafer'''
|style="background:WhiteSmoke; color:black"|
|style="background:WhiteSmoke; color:black"|
*BCB
*BCB
*III-V materials
*Co-polymer
*Co-polymer
*Silicon  
*Silicon, silicon oxide, silicon nitride
*Silicon oxide
*Silicon nitride
*Quartz
*Quartz
*Resist (prebaked)
*Resist (prebaked)
*III-V materials
*Metal (only Al, Ni, Ge and Au)
*Metal (only with carrier wafer)
|-  
|-  
|}
|}