Specific Process Knowledge/Thin film deposition/Deposition of Titanium Oxide: Difference between revisions
| Line 22: | Line 22: | ||
|Deposition rate | |Deposition rate | ||
| | | | ||
* | *3.0-3.5nm/min ± ? | ||
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* | * | ||
| Line 22: | Line 22: | ||
|Deposition rate | |Deposition rate | ||
| | | | ||
* | *3.0-3.5nm/min ± ? | ||
| | | | ||
* | * | ||