Specific Process Knowledge/Thermal Process: Difference between revisions
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*[[/Jipelec RTP|Jipelec RTP]] - ''For Rapid Thermal Anneal of III-V materials and Silicon based material'' | *[[/Jipelec RTP|Jipelec RTP]] - ''For Rapid Thermal Anneal of III-V materials and Silicon based material'' | ||
*[[/BCB Curing Oven|BCB Curing Oven]] - ''...'' | *[[/BCB Curing Oven|BCB Curing Oven]] - ''...'' | ||
*[[/Resist Pyrolysis Furnace|Resist Pyrolysis Furnace]] - ''.. | *[[/Resist Pyrolysis Furnace|Resist Pyrolysis Furnace]] - ''For resist pyrolysis of different resist layers'' | ||
The Resist Pyrolysis Furnace is used for resist pyrolysis, where samples with different resist layers are heated up to maximum 1000°C in a nitrogen atmosphere. At high temperatures carbon is formed by pyrolysis of the resist. In this way conductive structures can be made from a resist patterned sample | |||