Specific Process Knowledge/Thin film deposition/Deposition of Silicon Oxide: Difference between revisions
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! PECVD | ! PECVD | ||
! Sputter technique [[Specific Process Knowledge/Thin film deposition/Deposition of Silicon oxide in PVD co-sputter/evaporation|(PVD co-sputter/evaporation tool)]] | ! Sputter technique [[Specific Process Knowledge/Thin film deposition/Deposition of Silicon oxide in PVD co-sputter/evaporation|(PVD co-sputter/evaporation tool)]] | ||
!Sputter technique using [[Specific Process Knowledge/Etch/IBE⁄IBSD Ionfab 300|IBE/IBSD Ionfab300]] | |||
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| Stoichiometry | | Stoichiometry | ||