Specific Process Knowledge/Thermal Process/C3 Anneal-bond furnace: Difference between revisions
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==C3 Anneal-bond furnace== | ==C3 Anneal-bond furnace== | ||
[[Image:C3.JPG|thumb|300x300px|C3 Anneal- | [[Image:C3.JPG|thumb|300x300px|C3 Anneal-bond furnace. Positioned in cleanroom 2]] | ||
The C3 Anneal-bond furnace is a Tempress horizontal furnace for oxidation and annealing of (bonded) silicon wafers. | The C3 Anneal-bond furnace is a Tempress horizontal furnace for oxidation and annealing of (bonded) silicon wafers. | ||