Specific Process Knowledge/Thermal Process/A3 Phosphor Drive-in furnace: Difference between revisions
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==A3 | ==A3 Phosphor Drive-in furnace== | ||
[[Image:A3helstak.jpg|thumb|300x300px|A3 Phosphor | [[Image:A3helstak.jpg|thumb|300x300px|A3 Phosphor Drive-in furnace. Positioned in cleanroom 2]] | ||
The A3 | The A3 Phosphor Drive-in furnace is a Tempress horizontal furnace for oxidation of silicon wafers, annealing of the grown oxide and drive-in of phosphorus after a pre-deposition. Phosphorus pre-deposition takes place in the A4 Phosphor Pre-dep furnace. The Phosphor Drive-in furnace can also be used for drive-in of phosphorus which has been ion implanted. | ||
A3 is the third furnace tube in the A-stack positioned in cleanroom 2. The A-stack together with the C2 | A3 is the third furnace tube in the A-stack positioned in cleanroom 2. The A-stack together with the C2 Gate Oxide furnace are the cleanest of all furnaces in the cleanroom. Please be aware of which substrates are allowed to enter this furnace. Check the [http://www.labmanager.danchip.dtu.dk/view_binary.php?fileId=1250 cross contamination chart]. | ||
'''The user manual, quality control procedure and results, technical information and contact information can be found in LabManager:''' | '''The user manual, quality control procedure and results, technical information and contact information can be found in LabManager:''' | ||