Specific Process Knowledge/Thermal Process/A1 Bor Drive-in furnace: Difference between revisions
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==A1 Bor drive-in furnace== | ==A1 Bor drive-in furnace== | ||
[[Image:A1.JPG|thumb|300x300px|A1 Bor Drive-in furnace | [[Image:A1.JPG|thumb|300x300px|A1 Bor Drive-in furnace. Positioned in cleanroom 2]] | ||
The A1 Bor Drive-in furnane is a Tempress horizontal furnace for oxidation of silicon wafers, annealing of the grown oxide, drive-in of boron after a pre-deposition and oxidation of the boron phase layer. Boron pre-deposition takes place in the A2 Bor Pre-dep furnace. The Bor Drive-in furnace can also be used for drive-in of boron which has been ion implanted. | The A1 Bor Drive-in furnane is a Tempress horizontal furnace for oxidation of silicon wafers, annealing of the grown oxide, drive-in of boron after a pre-deposition and oxidation of the boron phase layer. Boron pre-deposition takes place in the A2 Bor Pre-dep furnace. The Bor Drive-in furnace can also be used for drive-in of boron which has been ion implanted. | ||