Specific Process Knowledge/Thermal Process/C4 Aluminium Anneal furnace: Difference between revisions
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==C4 | ==C4 Aluminium Anneal furnace== | ||
[[Image:C4helstak.jpg |thumb|300x300px|C4 Furnace Aluminium Anneal: positioned in cleanroom 2]] | [[Image:C4helstak.jpg |thumb|300x300px|C4 Furnace Aluminium Anneal: positioned in cleanroom 2]] | ||
C4 | The C4 Aluminium Anneal furnace is a Tempress horizontal furnace for annealing of silicon wafers with aluminium. | ||
This furnace is the lowest of the furnace tubes in the furnace C-stack positioned in cleanroom 2. In this furnace it is allowed to enter wafers that contains aluminium. Check the [http://www.labmanager.danchip.dtu.dk/view_binary.php?fileId=1250 cross contamination chart | This furnace is the lowest of the furnace tubes in the furnace C-stack positioned in cleanroom 2. In this furnace it is allowed to enter wafers that contains aluminium. Check the [http://www.labmanager.danchip.dtu.dk/view_binary.php?fileId=1250 cross contamination chart]. | ||
'''The user manual | '''The user manual, technical information and contact information can be found in LabManager:''' | ||
'''[http://www.labmanager.danchip.dtu.dk/function.php?module=Machine&view=view&mach=90 Furnace C4: Aluminium Anneal]''' | |||
==Process knowledge== | ==Process knowledge== | ||