Specific Process Knowledge/Etch/IBE⁄IBSD Ionfab 300: Difference between revisions
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*Results from the acceptance test: | *Results from the acceptance test: | ||
**[[/IBSD of TiO2|Deposition of TiO2]] | **[[/IBSD of TiO2|Deposition of TiO2]] | ||
**[[/IBSD of SiO2|Deposition of SiO2]] | **[[Specific Process Knowledge/Thin film deposition/Deposition of Silicon Oxide/IBSD of SiO2|Deposition of SiO2]] | ||
**[[/IBSD of Si|Deposition of Si]] | **[[/IBSD of Si|Deposition of Si]] | ||