Specific Process Knowledge/Thermal Process/A3 Phosphor Drive-in furnace: Difference between revisions
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[[Image:A3helstak.jpg|thumb|300x300px|A3 phosphorus drive-in furnace: positioned in cleanroom 2]] | [[Image:A3helstak.jpg|thumb|300x300px|A3 phosphorus drive-in furnace: positioned in cleanroom 2]] | ||
A3 Furnace | The A3 Furnace Phosphor drive-in is a Tempress horizontal furnace for oxidation of silicon wafers, annealing of the grown oxide and drive-in of phosphorus after a pre-deposition. Phosphorus pre-deposition takes place in the A4 Furnace Phosphor pre-dep. The A3 furnace can also be used for drive-in of phosphorus which has been ion implanted. | ||
A3 is the third furnace tube in the A-stack positioned in cleanroom 2. The A-stack together with | A3 is the third furnace tube in the A-stack positioned in cleanroom 2. The A-stack together with the C2 Furnace Gate oxide are the cleanest of all furnaces in the cleanroom. Please be aware of which substrates are allowed to enter this furnace. Check the [http://www.labmanager.danchip.dtu.dk/view_binary.php?fileId=1250 cross contamination chart]. | ||
'''The user manual | '''The user manual, quality control procedure and results, technical information and contact information can be found in LabManager:''' | ||
'''[http://www.labmanager.danchip.dtu.dk/function.php?module=Machine&view=view&mach=82 Phosphor Drive-in]''' | '''[http://www.labmanager.danchip.dtu.dk/function.php?module=Machine&view=view&mach=82 Furnace A3: Phosphor Drive-in]''' | ||
==Process knowledge== | ==Process knowledge== | ||