Specific Process Knowledge/Thermal Process/A1 Bor Drive-in furnace: Difference between revisions

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 !style="background:silver; color:black;" align="center"|Purpose
-|style="background:LightGrey; color:black"|Drive-in of boron, oxidation of silicon and boron phase layer and annealing of the oxide
+|style="background:LightGrey; color:black"|
+*Drive-in of boron
+*Oxidation of silicon
+*Oxidation of boron phase layer
+*Annealing of the oxide
 |style="background:WhiteSmoke; color:black"|Oxidation:
 *Dry
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 | style="background:LightGrey; color:black"|Substrate material allowed
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-*Silicon wafers (new from the box or RCA cleaned)
+*Silicon wafers (new or RCA cleaned wafers)
 *From A2 furnace directly (e.g. incl. Predep HF)
-*In doubt: look at [http://www.labmanager.danchip.dtu.dk/view_binary.php?fileId=1250 the cross contamination chart] or send a mail to [mailto:furnace@danchip.dtu.dk the Furnace group]
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