Specific Process Knowledge/Thermal Process/A1 Bor Drive-in furnace: Difference between revisions
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==A1 Furnace | ==A1 Furnace Bor drive-in== | ||
[[Image:A1.JPG|thumb|300x300px|A1 Boron drive in furnace: positioned in cleanroom 2]] | [[Image:A1.JPG|thumb|300x300px|A1 Boron drive in furnace: positioned in cleanroom 2]] | ||
A1 Furnace | The A1 Furnace Bor drive-in is a Tempress horizontal furnace for oxidation of silicon wafers, annealing of the grown oxide, drive-in of boron after a predeposition and oxidation of the boron phase layer. Bor predeposition takes place in the A2 Furnace Bor pre-dep. The A1 furnace can also be used for drive in of boron which has been ion implanted. | ||
A1 is the top furnace tube in the A-stack positioned in cleanroom 2. The A-stack together with | A1 is the top furnace tube in the A-stack positioned in cleanroom 2. The A-stack together with the C2 Furnace Gate oxide are the cleanest of all furnaces in the cleanroom. Please be aware of which substrates that are allowed to enter this furnace. Check [http://www.labmanager.danchip.dtu.dk/view_binary.php?fileId=1250 the cross contamination chart]. | ||
'''The user manual | '''The user manual, quality control procedure and results, technical information and contact information can be found in LabManager:''' | ||
'''[http://www.labmanager.danchip.dtu.dk/function.php?module=Machine&view=view&mach=47 Bor Drive-in]''' | '''[http://www.labmanager.danchip.dtu.dk/function.php?module=Machine&view=view&mach=47 Bor Drive-in]''' | ||